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Charan Krishna NICHENAMETLA

En résumé

Mes compétences :
International Management
Data Analysis
Microsoft Office
Customer Service
International Experience
Scientific research

Entreprises

  • KLA - Field application engineer

    2018 - 2019 o Drive product adoption at customer research and fabrication sites.
    o Communication and collaboration with international clients.
    o Coordinate day-to-day activities with internal and external teams.
    o Support local business unit to achieve business goals.
    o Being accountable for technical application support, development and implementation of company products in customer fabrication facilities.
    o Deliver technical presentations on all aspects of products.
    o Interpret complex business models and methodologies.
    o 70% of time dedicated to travel abroad to meet clients and sustain business.

    keywords: Customer engagement, pre-sales management, problem analysis and solving, data analysis, systems thinking.
  • Fraunhofer institute - Research associate

    2015 - 2018 Tasks and Responsibilities at Fraunhofer IPMS-CNT
    Process development of CMOS-compatible materials (silicides, Si, SiGe).
    o Literature survey and evaluation of feasible approach to deposit thin film silicides for novel thermoelectric and sensor applications.
    o Growth of pure metals and metal nitride films in a class 1000 cleanroom.
    o Investigation of surface and film properties.
    o Collaboration with international institutes for scientific discussions and external measurements.
    o Attending workshops, seminars, and conferences. International talk at European Conference for Thermoelectrics 2017, Padua (Italy).

    Publications as 1st author:
    • CMOS-compatible transition metal disilicide for integrated thermoelectric applications, in Materials Today proceedings, European Conference for Thermoelectrics (2017).
    • Tuning transport properties of cobalt monosilicide, in review.


    Tasks and Responsibilities at Fraunhofer ENAS
    • Evaluation of novel dicobaltatetrahedrane [Co2(CO)6(η2-H-C≡C-C5H11)] MOCVD precursor.
    o Deposition of pure cobalt oxide films in a vertical flow reactor at low temperatures for novel flexible applications.
    o Responsible for sensitive and high vacuum tools.
    o Microstructure analysis and grain growth study of thin films.
    o Cooperation with Technical University of Chemnitz (Inorganic Chemistry) for synthesizing cobalt precursor.

Formations

  • Technical University Of Chemnitz (Chemnitz)

    Chemnitz 2014 - 2017 Master of Science

    Modules: Microscopy and analysis, nano materials, semiconductor physics, process technologies, integrated circuit technology.
    • Thesis: Development of transition metal silicides as thin-film material for thermoelectric applications.
    • Research Project: Study of a novel dicobaltatetrahedrane precursor for depositing cobalt oxide films using MOCVD.
  • Visvesvaraya Technological University ECE (Bangalore)

    Bangalore 2008 - 2011 Bachelor of Engineering

Réseau

Pas de contact professionnel

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