Chercheur et directeur d'un laboratoire spécialise dans le domaine de la microelectronique
Entreprises
CNRS
- Directeur de recherche
ParismaintenantSummary: Expert on plasma processes with more than 22 years of experience in the field of Integrated Circuit Technology combined with a strong experience in management
Highly respected by peers, world wide audience in the field of plasma processes and silicon technologies
Professional Experience:
01/99 – current CNRS, Laboratoire des Technologies de la Microélectronique (LTM), France
Director
- Founder and director of “Laboratoire des Technologies de la Microélectronique”, CNRS, France composed of about 50 permanent members (professors, CNRS research staff members) and 50 non permanents (post-docs and PhD students) working in the field of plasma processes, advanced lithography techniques (resist, electromagnetic simulation, nano-imprint techniques) and nanomaterials (silicon nanocrystals, diblock copolymers, silicon nanowires).
- Director of “Federation des Micro-nanotechnologies – Minatec”, the union of 4 CNRS Laboratories working closely with CEA-LETI on the Minatec campus in Grenoble (400 assignees). Set up a joint strategy of the four laboratories in the field of Nanotechnologies and set up a new technological platform dedicated to beyond CMOS projects on the Minatec campus
Etch group manager
-Lead a team composed of 6 CNRS researchers and in average 10 post-docs and PhD students
- Lead a joint development program with Applied Materials on the etching of High K/metal gates using a modified 300 mm cluster tool equipped with powerful diagnostics of the plasma and plasma/surface interaction
- Drive the etch process development and characterization of materials involved in CMOS technologies for Front End and Back End applications (HighK/metal gate stack, study of plasma resist interactions and transfer of the resist roughness in complex gate stacks, Low k etch and stripping processes, plasma etching applied to nanotechnologies)
Education: 87 – 90 PhD in Electrical Engineering from University Joseph Fourier, Grenoble,France (1990)
86 M.S in Electrical Engineering from Ecole Nationale Superieure de Physique in Grenoble, France (1986)
Awards:
1995 R&D 100 awards in 1995 for the work on Plasma Polymerized Methylsilane at AT&T Bell Laboratories
2004 CNRS silver medal in 2004 for exceptional accomplishment in the field of plasma processes
2005 University Joseph Fourier Gold medal in 2005 for outstanding work in the field of plasma processes
Publications, patents, invited conferences
- More than 120 publications in international reviewed journals (53 papers published in JVST A & B)
- 10 patents
- 50 invited talks in international conferences
- Member of the scientific committee of AVS (97 through 2000 and 2007), SPIE (98-99) , MNE (since 1999), and DPS (since 2000)
-Teaching a course on plasma processes (20 hours) since 1999 in numerous places worldwide
- One of the 7 Members of the scientific committee of CEA France since 2007
