GRENOBLE
From 1997 to 1999, I worked on PECVD of SiO2 materials from organosilicon precursors in helicon plasma reactor (PhD Thesis)
From 1999 to 2001, I joined as an associate professor the Laboratory for Electrostatics and Dielectric Materials (LEMD) at the Grenoble University where I worked on the deposition and characterization of Diamond-Like Carbon (DLC) materials deposited from a Distributed Electron Cyclotron Resonance plasma reactor and I also developed a Plasma Based Ion Implantation (PBII) process.
Since 2001, I am at the Microelectronics Technology Laboratory (LTM) where I obtained in 2010 a full professor position. LTM is located on the Minatec Centre, a major French center for innovation and expertise in micro and nanotechnology.
My current research interests focus on the deposition (mainly PECVD and PEALD) and characterization of insulators used in microelectronics, such as high k oxides for integrated MIM capacitors and metal oxides for Resistive RAMs memories, GST (GeSbTe) materials for Phase Change RAMs memories, and metal gate deposition for CMOS devices. Most of this work is made in collaboration with STMicroelectronics and CEA/LETI on 200 mm and 300 mm industrial tools.
Between 2010 and 2015, I was at the head of the material department of Polytech Grenoble (French engineer school). I give lessons in Plasma Physics and Materials, Physics of dielectrics and solid state Physics
Since 2014, I am at the head of the joint laboratory between LTM and STMicroelectronics.
Since 2016 I have an invited Professor position at Tsukuba University at the advanced research laboratory
Mes compétences :
Nanotechnologies
Couche mince
Physique des plasmas
Pas de formation renseignée
