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Bruno LEE SANG

SHERBROOKE

En résumé

Travaillant dans le domaine de la microélectronique, et plus particulièrement sur la microfabrication de transistors monoélectroniques pour une intégration 3D de circuits hybrides SET-CMOS

Mes compétences :
CMOS
Transistors
ICP

Entreprises

  • Interdisciplinary Institute for Technological Innovation - Ph.D. candidate

    2011 - maintenant * Fabricated and characterized single electron transistors with sub-attofarad capacitances ;
    * Implemented novel ICP plasma etching processes for metallic and dielectric shallow nanostructures
    (TiN, SiO2 and Si3N4)
    * Integrated nanowires fabricated with a damascene process in the BEOL of a CMOS chip ;
    * Developed in-house electrolithography process for negative (HSQ) resist with low energy beam
    exposure and obtained 13 nm wide lines
    * Trained and supervised a number of students on clean-room machines

  • Nanofabrication and Nanocharacterization Research Center - Trainee Engineer

    2010 - 2010 * Developed a plasma etching process for the fabrication of 20 nm wide titanium nanostructures

Formations

Réseau

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